Work

Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography

Year: 2024

Type: article

Source: The Journal of Physical Chemistry Letters

DOI: 10.1021/acs.jpclett.4c01911

Authors: Rongbo Zhao, Yayi Wei, Xiaolin Wang, Xiangming He, Hong Xu

Institutions: Tsinghua University, Chinese Academy of Sciences, Institute of Microelectronics, University of Chinese Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G7841777469

OpenAlex ID: W4401688848

FWCI: 0.513

Cites: 28

Cited by: 5

Related to: 10