Work

Low-thermal-budget crystallization of ferroelectric Al:HfO2 films by millisecond flash lamp annealing

Year: 2024

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/ad70bf

Authors: Hideaki Tanimura, Yuma Ueno, Tomoya Mifune, Hironori Fujisawa, Seiji Nakashima, Ai I. Osaka, Shinichi Kato, Takumi Mikawa

Institutions: University of Hyogo, SCREEN Semiconductor Solutions Co., Ltd. (Japan), Hyogo University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401689012

FWCI: 0.729

Cites: 30

Cited by: 7

Related to: 10