Work

Remote plasma-enhanced chemical vapor deposition of GeSn on Si (100), Si (111), sapphire, and fused silica substrates

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0003689

Authors: B. Claflin, G. J. Grzybowski, S. Zollner, B. R. Rogers, T. A. Cooper, D. C. Look

Institutions: Wright-Patterson Air Force Base, U.S. Air Force Research Laboratory Sensors Directorate, KBR (United States), New Mexico State University, Vanderbilt University, Wright State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Division of Materials Research, Air Force Office of Scientific Research

Awards: G3765373466, G4695995733, G5197644221, G5773616795, G7328390943, G8459417737

OpenAlex ID: W4401713731

FWCI: 0.312

Cites: 49

Cited by: 3

Related to: 10