Work

Optimizing Cobalt Silicide Interfaces With Carbon PAI: Enhanced Thermal Stability and Reduced Specific Contact Resistivity for DRAM Applications

Year: 2024

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2024.3430890

Authors: Yanping He, Shujuan Mao, Jing Xu, Xianglie Sun, Xu Chen, Jianfeng Gao, Weibing Liu, Jinbiao Liu, Junfeng Li, Guilei Wang, Chao Zhao, Jun Luo

Institutions: Chinese Academy of Sciences, Institute of Microelectronics

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: Chinese Research Academy of Environmental Sciences, Guangxi Key Research and Development Program

Awards: G4035579648, G5803431025

OpenAlex ID: W4401725625

FWCI:

Cites: 22

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Related to: 10