Ultrathin Metal Films with Low Resistivity via Atomic Layer Deposition: Process Pressure Effect on Initial Growth Behavior of Ru Films
Year: 2024
Type: article
Source: Chemistry of Materials
Authors: Na-Gyeong Kang, Min-Ji Ha, Ji-Hoon Ahn
Institution: Hanyang University
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G1533426407, G7042045656
OpenAlex ID: W4401735035