Work

Enhancement of mask data verification with Smart-MRC and machine learning

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3034282

Authors: Fei Lin Liu, Shu Yi Chou, Chi Ian Ip, Hui Min Leong, Min Ru Wei, Po Sheng Wang, Liang Chieh Lin, Saghir Munir

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401871338

FWCI:

Cites: 2

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Related to: 10