Work

Imaging evaluation of low reflectivity low-n EUV mask for LS at 0.33NA

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3032310

Authors: Tatiana Kovalevich, Nick Pellens, Guillaume Libeert, Lieve Van Look, Vicky Philipsen

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401875089

FWCI: 1.562

Cites: 16

Cited by: 2

Related to: 10