Work

Applicability of projection exposure using a gradient-index lens array to thick resist patterning of more than 100-um

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3030657

Authors: Toshiyuki Horiuchi, Naoyuki Otsuka, Takeharu Fukuhara Fukuhara, Hiroshi Kobayashi

Institution: Tokyo Denki University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401875253

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Cites: 16

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Related to: 10