A study on directional damaged defect in photomask manufacturing process
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3032447
Authors: Ansel Huang, Joyce Wang, Mazer Li, Vies Yu, Josh Cheng, Kuang Huang, Zack Huang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401875279