Integration of E-beam mask writer corrections in MPC applications
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3034234
Authors: Ingo Bork, Rachit Sharma, Malavika Sharma, Archana Rajagopalan, Bhardwaj Durvasula, Kushlendra Mishra, Mary Zuo
Institutions: Siemens (United States), Siemens (Germany)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401875498