Actinic blank inspection for high-NA EUV lithography
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3033664
Authors: Ryo Watanabe, Tomoro Ide, Shohei Sakuma, Tomohiro Suzuki
Institution: Lasertec Corporation (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401875506
