Mo/Si multilayer improvements for EUV photomask performance
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3034862
Authors: Kenji Yamamoto, Antonio Checco, Katrina Rook, Maryam Souri, Marjorie Chee, Meng H. Lee
Institution: Veeco (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401875515