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Exploring high-NA EUV mask specification for logic metal

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3035717

Authors: Kenichi Miyaguchi, Soobin Hwang, Apoorva Oak, Ryoung-han Kim

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401875533

FWCI:

Cites: 4

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Related to: 10