Work

Curvilinear mask metrology: What’s the 2D equivalent of CD?

Year: 2024

Type: conference-paper

DOI: 10.1117/12.3033233

Authors: Linyong Pang, Dakota Seal, Tom Boettiger, Nagesh Shirali, Grace Dai, Aki Fujimura

Institution: Micron (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4401877306

FWCI: 1.56

Cites: 22

Cited by: 2

Related to: 10