EUV mask inspection technologies with actinic tool for DRAM and logic lithography
Year: 2024
Type: conference-paper
DOI: 10.1117/12.3031837
Authors: Cheolki Min, Daeho Sung, Jeongmin Kim, Hongcheol Kim, Sobin Ji, Hakseung Han, Jonggul Doh, Inyong Kang, Jin Choi, Sanghee Lee, Satoru DOI, Toshiyuki Todoroki, Hiroki Miyai, Jaehee Han, Youngsub Jang
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401877517