Modification of Interface Quality and Electrical Performance of ErSmO/InP Gate-Stacks by ALD-Driven HfAlOx Interlayers
Year: 2024
Type: article
Authors: Jinyu Lu, Gang He, Li Cheng, Bing Yang, Shanshan Jiang
Institution: Anhui University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401879230