Ge-on-Si APD with Diagonal Dual Injection in 45nm SOl SiPh Process
Year: 2024
Type: conference-paper
Institution: Rensselaer Polytechnic Institute
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4401943303
