Work

Thickness dependence and crystallization properties of amorphous GeTe thin films on silicon dioxide

Year: 2024

Type: article

Source: Physica Scripta

DOI: 10.1088/1402-4896/ad75cf

Authors: Zhengquan Zhou, Weihua Wu, Yu Li, Jiwei Zhai

Institutions: Jiangsu University of Technology, National Laboratory of Solid State Microstructures, Nanjing University, Tongji University

Language: English

Topic: Phase-change materials and chalcogenides

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402029703

FWCI: 0.192

Cites: 50

Cited by: 2

Related to: 10