Work

Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0003791

Authors: Qi Wang, Kuibo Wang, Xiaobin Wu, Zixiang Gao

Institutions: Chinese Academy of Sciences, Institute of Microelectronics, University of Chinese Academy of Sciences

Language: English

Topic: Particle Dynamics in Fluid Flows

Subfield: Ocean Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: 基于在线计量技术的极紫外光致放气机理研究

OpenAlex ID: W4402045118

FWCI: 0.354

Cites: 23

Cited by: 2

Related to: 10