Development of high on/off current ratio in p-type copper oxide thin-film transistors with a back-end-of-line compatible process
Year: 2024
Type: article
DOI: 10.1116/5.0226672
Authors: Chi-Yuan Kuo, Wei-Chen Lin, Tsung-Tien Lo, Ching-Hsuan Shen, Ming-Yu Shen, Chia-Chan Lee, Chi-Ping Lin, Yuang-Ming Lin, Haw-Tyng Huang, Po-Chun Yeh, Hsin-Chu Chen, Chih-I Wu
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: Semiconductor Beol Process Compatibility:Development of High-Performance P-Type Laminated Cuox Tft and Integration into Cmos Inverter Verification, Assembled 2d Material Heterostructures: Interfacial Interaction, Surface Doping, and Electronic Structure Analysis, Towards Next-Generation Semiconductor Technology: Enhancing the Performance of Normally-Off Gan Hemt and Oxide Tft with Beol-Compatible P-Type Laminated Cuox Structure, G443691678, Core Facility Establishment Project for the Semiconductor Collage of National Sun Yat-Sen University( I ), G8296887506
OpenAlex ID: W4402047641
