Effects of High Gate Voltage Stress on Threshold Voltage Stability in Planar and Trench SiC Power MOSFETs
Year: 2024
Type: article
Abstract: Gate oxide reliability is a challenge in SiC MOSFETs particularly due to the presence of high electric field in the dielectric during device operation and blocking, and SiC/SiO2interfaces suffer from a high density of traps and defects that can cause charge trapping and threshold voltage shift. Highly accelerated gate bias testing can be used for testing gate field effects on device reliability/stability, but care must be taken that the high acceleration biases do not invoke failure mechanisms that fall outside of normal device operation conditions. In this work, we attempt to address that aspect of high voltage gate tests in terms of threshold voltage instability and perform a comparative analysis between commercially available planar and trench SiC MOSFETs.
DOI: 10.4028/p-02ncko
Authors: Ayan K. Biswas, Daniel J. Lichtenwalner, Suman Das, Caleb Isaacson, Satyaki Ganguly, Donald A. Gajewski
Institution: Wolfspeed, Inc. (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
OpenAlex ID: W4402214657