Work

Effects of gallium surfactant on AlN thin films by microwave plasma chemical vapor deposition

Year: 2024

Type: article

Source: Journal of Semiconductors

DOI: 10.1088/1674-4926/24020017

Authors: Lu Wang, Xulei Qin, Li Zhang, Kun Xu, Feng Yang, Shaoqian Lu, Yifei Li, Bosen Liu, Guohao Yu, Zhongming Zeng, Baoshun Zhang

Institutions: Changchun University of Science and Technology, Chinese Academy of Sciences, Suzhou Institute of Nano-tech and Nano-bionics

Language: English

Topic: GaN-based semiconductor devices and materials

Subfield: Condensed Matter Physics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402227988

FWCI: 0.149

Cites: 43

Cited by: 1

Related to: 10