Work

Ultra-low loss silicon nitride becomes even cooler

Year: 2024

Type: other

Abstract: Ultra-low loss silicon nitride realized using deuterated precursors and low thermal budgets well within backend-of-line CMOS processing may accelerate widespread proliferation of their use.

Source: Light Science & Applications

DOI: 10.1038/s41377-024-01576-1

Authors: Dawn T. H. Tan, Xavier X. Chia

Institutions: Agency for Science, Technology and Research, Singapore University of Technology and Design, Institute of Microelectronics

Language: English

Topic: Photonic and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $4,190

Funders: National Research Foundation, Agency for Science, Technology and Research, National Research Foundation Singapore, Ministry of Education - Singapore, Institute of Microelectronics

Awards: G1660208221, G4219027852, G562941595, G5822760440, G638820372, G6627902538

OpenAlex ID: W4402285887

Cites: 24

Cited by: 7

Related to: 10