Work

Damage-Free Plasma Source for Atomic-Scale Processing

Year: 2024

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.4c02598

Authors: Junyoung Park, Jiwon Jung, Min-Seok Kim, Chang-Min Lim, Jung-Eun Choi, Nayeon Kim, Ju-Ho Kim, Chin-Wook Chung

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Ministry of SMEs and Startups, Korea Semiconductor Research Consortium, Korea Evaluation Institute of Industrial Technology

Awards: G1612479703, G2531033225, G3168497709, G4204058157, G4478748991, G487754762, G5563016471, G5794484594, G623835629, G6702171884, G8038332580, G8872163489, G8896296220

OpenAlex ID: W4402316390

FWCI: 1.873

Cites: 85

Cited by: 18

Related to: 10