Work

Highly Selective Etching of Silicon Dioxide Over Aluminum Using Mixtures of Sulfuric Acid and Hydrofluoric Acid

Year: 2024

Type: article

Source: Journal of Microelectromechanical Systems

DOI: 10.1109/jmems.2024.3450911

Authors: Tae-Soo Kim, Yong-Bok Lee, So-Young Lee, Sung-Ho Kim, Jun-Bo Yoon

Institutions: Korea Advanced Institute of Science and Technology, Chonnam National University

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Science and ICT, South Korea, Samsung

Award: G3930899909

OpenAlex ID: W4402350460

FWCI: 0.104

Cites: 16

Cited by: 1

Related to: 10