Work

Examination of nonideal film growth in batch atomic layer deposition for plasma-resistant coatings

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0003777

Authors: Lanxin Guo, Yixian Wang, Zifan Pang, Xin Han, Yafeng Wang, Lipei Peng, Xin Gao, Chunlei Pei, Tuo Wang, Jinlong Gong

Institutions: Tianjin University, Collaborative Innovation Center of Chemical Science and Engineering Tianjin

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China, Project 211

Awards: G2241568543, G3474161743, G6192987231, G6989794335, G7646326654

OpenAlex ID: W4402365909

FWCI: 0.308

Cites: 67

Cited by: 3

Related to: 10