Work

Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.23.3.034603

Authors: Seonggil Heo, Seungjoo Baek, Mihir Gupta, Hyo Seon Suh, Kodai Kato, Satoshi Takeda, Wataru Shibayama, Rikimaru Sakamoto

Institutions: IMEC, Nissan Chemical Corporation (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402376196

FWCI: 0.205

Cites: 16

Cited by: 2

Related to: 10