Work

Effects of Diethoxymethylsilane/Helium Flow Rate Ratio on Low-k Films Deposited by Plasma-Enhanced Chemical Vapor Deposition

Year: 2024

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/ad7900

Authors: Chanyong Seo, Namwuk Baek, Yoonsoo Park, Hyuna Lim, Sungwoo Lee, Jeayoung Yang, Seonhee Jang, Donggeun Jung

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Sungkyunkwan University

OpenAlex ID: W4402398047

FWCI: 0.231

Cites: 39

Cited by: 3

Related to: 10