Optimizing deposition parameters and characterizing TiO 2 thin films for future memristor applications
Year: 2024
Type: article
Source: Physica Scripta
Authors: Shilpa Shivaram, Done Rinshun Paul, Suresh Babu S K, Vigneshwaran B, Haritha Sree V, Roshan Johns J, Nirmal D
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4402503537