Effect of NH3 flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition
Year: 2024
Type: article
DOI: 10.1116/6.0003862
Authors: Ju Eun Kang, Sang Jeen Hong
Institution: Myongji University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G4121059147
OpenAlex ID: W4402519026