Development of a cuttings migration simulation device based on electrical resistance tomography technology
Year: 2024
Type: conference-abstract
DOI: 10.1117/12.3045781
Authors: Shiyan Xing, Daqian Yang, Shuaibin Zhang
Institution: Xi'an Shiyou University
Language: English
Subfield: Geophysics
Field: Earth and Planetary Sciences
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4402672643
