Work

3D OPC method for GLV parallel scanning lithography microstructure topography control based on SinCUT

Year: 2024

Type: article

Abstract: A 3D optical proximity correction (OPC) optimization method based on single image contrastive unpaired translation (SinCUT) is proposed for the precise fabrication of 3D microstructures in GLV parallel scanning digital 3D lithography. This method is applied to the optimized fabrication of hyperbolic micro-convex lens arrays. Its fabrication accuracy is demonstrated, showing a significant reduction in the mean square error (MSE) of the morphology. When the lens height is 8.5 µm, the average height error of the lens shape is less than 5%, and the MSE is reduced from 0.727 to 0.0329, resulting in a reduction rate of 92.79%.

Source: Optics Express

DOI: 10.1364/oe.538099

Authors: Deming Wang, Hao Cao, Shuo Chen, Yu Shu, Hui Wan, Chengqun Gui

Institution: Wuhan University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funder: National Natural Science Foundation of China