Work

Single‐Component High‐Resolution Dual‐Tone EUV Photoresists Based on Precision Self‐Immolative Polymers

Year: 2024

Type: article

Source: Angewandte Chemie

DOI: 10.1002/ange.202415588

Authors: Jie Cen, Wen Liu, Jie Xu, Xiuxia Wang, Jialin Zhang, Jin Zhang, Zhengyu Deng, Chenggang Zhou, Jinming Hu, Shiyong Liu

Institutions: University of Science and Technology of China, Hefei National Center for Physical Sciences at Nanoscale

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402709712

FWCI: 0.103

Cites: 54

Cited by: 1

Related to: 10