High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle
Year: 2024
Type: article
DOI: 10.1116/6.0003837
Authors: Hironori Torii, Shinsuke Matsui
Institutions: Japan Steel Works (Japan), Chiba Institute of Technology
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4402729223