Work

Atomic‐Scale Structural Dynamics at a‐Si:H/c‐Si Heterointerface During Low‐Temperature Thermal Annealing

Year: 2024

Type: article

Source: Advanced Functional Materials

DOI: 10.1002/adfm.202413141

Authors: Xianlin Qu, Feihong Chu, Yongcai He, Xiaoqing Chen, Zilong Zheng, Xixiang Xu, Zhenguo Li, Hui Yan, Yongzhe Zhang, Kun Zheng

Institutions: Beijing University of Technology, Nanjing University of Aeronautics and Astronautics, Hebei Vocational University of Technology and Engineering

Language: English

Topic: Silicon and Solar Cell Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, China Postdoctoral Science Foundation, Natural Science Foundation of Hebei Province, Beijing Municipal Natural Science Foundation, National Key Research and Development Program of China

Awards: G3935300322, G4201202482, 热电材料中缺陷结构原子尺度演化与电学性能直接关联的研究, G5119422622, G5434981902, 高效硅基太阳电池材料与器件设计

OpenAlex ID: W4402807924

FWCI: 0.513

Cites: 45

Cited by: 5

Related to: 10