Work

Through pitch line width difference minimization by pixel source optimization

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3037354

Authors: Min-woo Kim, Da-Kyung Yu, Yu-Jin Chae, Hee-Chang Ko, Ji-Won Kang, Michael Yeung, Seung-Woo Son, Hye-Keun Oh

Institution: Hanyang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402862661

FWCI:

Cites: 5

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Related to: 10