Work

Source optimization for the whole arc slit with minimum optical proximity correction applied to contact hole patterns

Year: 2024

Type: conference-paper

Source: International Conference on Extreme Ultraviolet Lithography

DOI: 10.1117/12.3036974

Authors: Da-Kyung Yu, Min-Woo Kim, Gug-Young Kim, Yu-Jin Chae, Seung-Woo Son, Michael Yeung, Hye-Keun Oh

Institution: Hanyang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402890361

FWCI:

Cites: 11

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Related to: 10