Work

Dielectric Material and Thermal Optimization in Sidewall Spacer Design for Junctionless Nanosheet FETs at Sub- 5 nm Technology Node: An Insight into Device and Circuit Performance

Year: 2024

Type: article

Source: ECS Journal of Solid State Science and Technology

DOI: 10.1149/2162-8777/ad80ca

Authors: Vanitha Indhur, Uma Maheshwari Dupati, Manasa Lakkarasu, Sravya Sanga, Sresta Valasa, Venkata Ramakrishna Kotha, Sunitha Bhukya, Narendar Vadthiya, Bheemudu Vadthya, Narendar Malishetty, Satish Maheshwaram

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402911016

FWCI: 0.937

Cites: 38

Cited by: 9

Related to: 10