Work

Robust topological insulating property in C2X-functionalized III-V monolayers

Year: 2024

Type: article

Source: Nanotechnology

DOI: 10.1088/1361-6528/ad8098

Authors: Xianghong Xue, Zhihua Lin, Rui Gao, Bingzhuo Yang, Haoyu Wang, Mengmeng Han, Nannan Han

Institutions: Xi'an University of Technology, Northwestern Polytechnical University

Language: English

Topic: Topological Materials and Phenomena

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, China Postdoctoral Science Foundation, Key Research and Development Projects of Shaanxi Province

Awards: G2484606627, G529812606, G8811814106

OpenAlex ID: W4402911534

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