Work

Spatial and Energetic Mapping of Traps in FeFET During Endurance Process by Advanced Trap Characterization Platform

Year: 2024

Type: article

Source: IEEE Electron Device Letters

DOI: 10.1109/led.2024.3469372

Authors: Hongye Yuan, Yuanquan Huang, Tiancheng Gong, Yuan Wang, Pengfei Jiang, Wei Wei, Yang Yang, Junshuai Chai, Zhicheng Wu, Xiaolei Wang, Qing Luo

Institutions: Chinese Academy of Sciences, Institute of Microelectronics

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Chinese Academy of Sciences, Youth Innovation Promotion Association of the Chinese Academy of Sciences

Awards: G2764041933, G4985373071, G5865070634, G6800275950

OpenAlex ID: W4402915423

FWCI: 7.013

Cites: 27

Cited by: 68

Related to: 10