Large-Scale High-Accuracy and High-Efficiency Phase Plate Machining

Year: 2024

Type: article

Abstract: In this paper, multifunctional, multilevel phase plates of quartz substrate were efficiently prepared by using a newly developed polygon scanner-based femtosecond laser photolithography system combined with inductively coupled discharge plasma reactive-ion etching (ICP-RIE) technology. The femtosecond laser photolithography system can achieve a scanning speed of 5 m/s and a preparation efficiency of 15 cm2/h while ensuring an overlay alignment accuracy of less than 100 nm and a writing resolution of 500 nm. The ICP-RIE technology can control the etching depth error within ±5 nm and the mask-to-mask edge error is less than 1 μm. An 8-level Fresnel lens phase plate with a focal length of 20 mm and an 8-level Fresnel axicon phase plate with a cone angle of 5° were demonstrated. The diffraction efficiency was greater than 93%, and their performance was tested for focusing and glass cutting, respectively. Combined with the high-speed femtosecond laser photolithography system’s infinite field-of-view (IFOV) processing capability, the one-time direct writing preparation of phase plate masks of different sizes was realized on a 6-inch wafer. This is expected to reduce the production cost of quartz substrate diffractive optical elements and promote their customized mass production.

Source: Nanomaterials

DOI: 10.3390/nano14191563

Authors: Guanhua Wang, Zhaoxiang Liu, Lvbin Song, Jianglin Guan, Wei Chen, Jian Liu, Jinming Chen, Min Wang, Ya Cheng

Institutions: East China Normal University, Shanxi University, Chinese Academy of Sciences, Shandong Normal University, Shanghai Institute of Optics and Fine Mechanics, State Key Laboratory of High Field Laser Physics, Shanghai Research Center for Quantum Sciences

Language: English

Topic: Laser Material Processing Techniques

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $3,296

Funders: National Natural Science Foundation of China, Science and Technology Commission of Shanghai Municipality, East China Normal University, National Key Research and Development Program of China, Fundamental Research Funds for the Central Universities

OpenAlex ID: W4402925742