Overcoming challenges in fabrication of beam shaping meta-optics using sensitive mr-EBL resist
Year: 2024
Type: article
Abstract: Shaping light to meet the needs of diverse optical applications is of utmost importance. Beam shaping allows one to alter the properties of light, enabling more complex behavior not possible with standard beams, such as Gaussian beams. Such beams have been generated using diffractive optics and more recently, meta-optics. For the latter, standard fabrication processes using electron beam lithography with the popular polymethyl methacrylate resist exist. However, there are several challenges due to the sub-wavelength features. We propose an alternate fabrication approach using a highly sensitive resist called mr-EBL resist. We show how the use of this resist reduces the patterning time, as well as the number of process steps. The process is explained with a case study on the fabrication of a meta-optical element that generates a modified Bessel beam with special properties.
Source: Journal of Optical Microsystems
Authors: Jerin Geogy George, Shanti Bhattacharya
Institution: Indian Institute of Technology Madras
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Funders: Department of Science and Technology, Ministry of Science and Technology, India, Indian Institute of Technology Madras, Ministry of Education, India, Ministry of Electronics and Information technology, Scheme for Promotion of Academic and Research Collaboration, Division of Human Resource Development
Award: G4098001492
OpenAlex ID: W4402927216