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Extreme Chemical Reduction on Photoresist Stripping Process by Using Sulfuric Acid Ozone Mixture in Liquid Film

Year: 2024

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/11401.0125ecst

Authors: Tsung-Ju Lin, Yu Yamaguchi, Shuichi Shibata, Keigo Tamura, Naozumi Fujiwara, Masaki Inaba

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

OpenAlex ID: W4402931186

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