Work

Rate Equation for TiN Etching in Dilute H2O2

Year: 2024

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/11401.0117ecst

Authors: Dai Ueda, Akiko Harumoto

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402931190

FWCI: 0.803

Cites:

Cited by: 1

Related to: 10