Work

Quantitative Modelling of Residual Molecular Contamination in Low-Pressure Processing Environments

Year: 2024

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/11401.0051ecst

Author: Paul W. Mertens

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402931228

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