Work

Surface Damage by Physical Cleans during Semiconductors Manufacturing

Year: 2024

Type: conference-paper

Source: ECS Transactions

DOI: 10.1149/11401.0073ecst

Authors: Philippe Garnier, Hugo Galbes, Laurent Viravaux

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402931486

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