Enhanced Stability Under Positive Bias Temperature Stress in Oxide Thin Film Transistors with Double Gate Structure By Improving Bottom Channel Interface
Year: 2024
Type: conference-paper
Source: ECS Transactions
Authors: Kyoung-Seok Son, Myoeng-Ho Kim, Seung-Hun Lee, Youn-Goo Kim, Jaybum Kim, Sunhee Lee
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4402931487