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Process matching and mask error characterization of standard mask processes using electron beam (EB) mask simulation

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034705

Authors: Mohamed Ramadan, Young M. Ham, Juergen Preuninger, Hans-Jurgen Stock, Jirka Schatz, Heath Wheeler, Chris Progler

Institutions: Photronics (United States), Synopsys (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4402974020

FWCI:

Cites: 3

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Related to: 10