Work

Nano-Meter Resolution Line-Offset Detector Arrays (LODAs) for Pattern Monitoring in EUV Lithography System

Year: 2024

Type: article

Source: IEEE Transactions on Electron Devices

DOI: 10.1109/ted.2024.3462670

Authors: Wei Chang, Burn Jeng Lin, Pin-Jiun Wu, Jiaw-Ren Shih, Yue-Der Chih, Jonathan Chang, Chrong Jung Lin, Ya-Chin King

Institutions: National Tsing Hua University, National Synchrotron Radiation Research Center, Taiwan Semiconductor Manufacturing Company (Taiwan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Taiwan Semiconductor Manufacturing Company, Ministry of Science and Technology, Taiwan

Award: G6614175964

OpenAlex ID: W4402980053

FWCI:

Cites: 24

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Related to: 10