Work

Effect of Al precursor’s properties on interactions with self-assembled monolayers for area selective deposition

Year: 2024

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0003847

Authors: Eryan Gu, Jin Yan, Boxuan Li, Huilong Zhou, Zhuhui Lu, Yanwei Wen, Kun Cao, Rong Chen

Institutions: Huazhong University of Science and Technology, State Key Laboratory of Materials Processing and Die & Mould Technology

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China, Fundamental Research Funds for the Central Universities

Awards: G5922455198, G6949762422, G878941572

OpenAlex ID: W4402989562

FWCI: 0.615

Cites: 39

Cited by: 6

Related to: 10